Warren Montgomery: search on Z-Library

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1

Optical critical dimension metrology for directed self-assembly assisted contact hole shrink

Dixit, Dhairya, Green, Avery, Hosler, Erik R., Kamineni, Vimal, Preil, Moshe E., Keller, Nick, Race, Joseph, Chun, Jun Sung, O’Sullivan, Michael, Khare, Prasanna, Montgomery, Warren, Diebold, Alain C.

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2016

Language:

english

File:

PDF, 7.08 MB

english, 2016

2

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Geometrically induced dose correction method for e-beam lithography applications

Galler, R., Choi, K.-H., Gutsch, M., Hohle, C., Krueger, M., Ramos, L. E., Suelzle, M., Weidenmueller, U., Montgomery, M. Warren, Maurer, Wilhelm

Year:

2010

Language:

english

File:

PDF, 4.35 MB

english, 2010

3

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - Correlation of overlay performance and reticle substrate non-flatness effects in EUV lithography

Raghunathan, Sudhar, Zurbrick, Larry S., Montgomery, M. Warren, Munder, Adam, Hartley, John, Sohn, Jaewoong, Orvek, Kevin

Year:

2009

Language:

english

File:

PDF, 1000 KB

english, 2009

4

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - 6-inch circle template fabrication for patterned media using a conventional resist and new chemically amplified resists

Hoga, Morihisa, Zurbrick, Larry S., Montgomery, M. Warren, Fukuda, Masaharu, Chiba, Tsuyoshi, Ishikawa, Mikio, Itoh, Kimio, Kurihara, Masaaki, Toyama, Nobuhito, Hayashi, Naoya

Year:

2009

Language:

english

File:

PDF, 13.39 MB

english, 2009

5

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Direct write electron beam lithography: a historical overview

Pfeiffer, Hans C., Montgomery, M. Warren, Maurer, Wilhelm

Year:

2010

Language:

english

File:

PDF, 845 KB

english, 2010

6

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Improving model prediction accuracy for ILT with aggressive SRAFs

Jung, Sunggon, Sim, Woojoo, Jeong, Moongyu, Ser, Junghoon, Lee, Sungwoo, Choi, Seoung-woon, Zhou, Xin, Luan, Lan, Cecil, Thomas, Son, Donghwan, Gleason, Robert, Kim, David, Montgomery, M. Warren, Maur

Year:

2010

Language:

english

File:

PDF, 1.45 MB

english, 2010

7

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - A systematic approach to the determination of SRAF capabilities in high end mask manufacturing

Bürgel, Christian, Montgomery, M. Warren, Maurer, Wilhelm, Sczyrba, Martin, Cantrell, G. R.

Year:

2010

Language:

english

File:

PDF, 1.49 MB

english, 2010

8

Why should marketing and manufacturing work together?: Some exploratory empirical results

Warren H. Hausman, David B. Montgomery, Aleda V. Roth

Journal:

Journal of Operations Management

Year:

2002

Language:

english

File:

PDF, 184 KB

english, 2002

9

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 24 February 2008)] Optical Microlithography XXI - 22nm half-pitch patterning by CVD spacer self alignment double patterning (SADP)

Bencher, Chris, Chen, Yongmei, Dai, Huixiong, Montgomery, Warren, Huli, Lior, Levinson, Harry J., Dusa, Mircea V.

Year:

2008

Language:

english

File:

PDF, 403 KB

english, 2008

10

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Development and characterization of a thinner binary mask absorber for 22-nm node and beyond

Faure, Tom, Montgomery, M. Warren, Maurer, Wilhelm, Badger, Karen, Kindt, Louis, Kodera, Yutaka, Komizo, Toru, Kondo, Shinpei, Mizoguchi, Takashi, Nemoto, Satoru, Seki, Kazunori, Senna, Tasuku, Wistro

Year:

2010

Language:

english

File:

PDF, 1.88 MB

english, 2010

11

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Using principal component analysis for photomask CD signature investigations

Cantrell, G. R., Montgomery, M. Warren, Maurer, Wilhelm, Bürgel, Christian, Feicke, Axel, Sczyrba, Martin, Utzny, Clemens

Year:

2010

Language:

english

File:

PDF, 283 KB

english, 2010

12

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - A systematic study of source error in source mask optimization

Alleaume, C., Yesilada, E., Farys, V., Depre, L., Arnoux, V., Li, Zhipan, Trouiller, Y., Serebriakov, A., Montgomery, M. Warren, Maurer, Wilhelm

Year:

2010

Language:

english

File:

PDF, 665 KB

english, 2010

13

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Extreme Ultraviolet (EUV) Lithography VI - The patterning center of excellence (CoE): an evolving lithographic enablement model

Wood, Obert R., Panning, Eric M., Montgomery, Warren, Chun, Jun Sung, Liehr, Michael, Tittnich, Michael

Year:

2015

Language:

english

File:

PDF, 715 KB

english, 2015

14

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Substrate aware OPC rules for edge effect in block levels

Shao, Dongbing, Montgomery, M. Warren, Maurer, Wilhelm, Bailey, Todd C., Stobert, Ian, Popova, Irene, Chang, Chan Sam

Year:

2010

Language:

english

File:

PDF, 1.16 MB

english, 2010

15

SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Advances in Resist Technology and Processing VII - Sensitivity enhancers for chemically amplified resists

Brunsvold, William R., Kwong, Ranee W., Montgomery, Warren, Moreau, Wayne M., Sachdev, Harbans S., Welsh, Kevin M., Watts, Michael P. C.

Year:

1990

Language:

english

File:

PDF, 704 KB

english, 1990

16

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Benchmarking study of EUV resists for NXE:3300B

Panning, Eric M., Goldberg, Kenneth A., Fan, Yu-Jen, Mellish, Mac, Chun, Jun Sung, McWilliams, Scott, Montgomery, Cecilia, Montgomery, Warren

Year:

2016

Language:

english

File:

PDF, 7.61 MB

english, 2016

17

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Mask Industry Assessment: 2010

Hughes, Greg, Montgomery, M. Warren, Maurer, Wilhelm, Chan, David Y.

Year:

2010

Language:

english

File:

PDF, 472 KB

english, 2010

18

SPIE Proceedings [SPIE Advances in Resist Technology and Processing VIII - San Jose, United States (Monday 4 March 1991)] Advances in Resist Technology and Processing VIII - Nonmetallic acid generators for i-line and g-line chemically amplified resists

Brunsvold, William R., Montgomery, Warren, Hwang, Bao, Ito, Hiroshi

Year:

1991

Language:

english

File:

PDF, 1.11 MB

english, 1991

19

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - 6-inch circle template fabrication for patterned media

Itoh, Kimio, Montgomery, M. Warren, Maurer, Wilhelm, Hoga, Morihisa, Toyama, Nobuhito

Year:

2010

Language:

english

File:

PDF, 4.72 MB

english, 2010

20

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - New method to determine process window considering pattern failure

Yang, Seung-Hune, Montgomery, M. Warren, Maurer, Wilhelm, Moon, Seongho, Ser, Junghoon, Kim, Young-Chang, Choi, Sung-Woon, Kang, Chang-Jin

Year:

2010

Language:

english

File:

PDF, 2.16 MB

english, 2010

21

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - E-beam direct write (EBDW) as complementary lithography

Lam, David, Montgomery, M. Warren, Maurer, Wilhelm, Liu, Dave, Prescop, Ted

Year:

2010

Language:

english

File:

PDF, 372 KB

english, 2010

22

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Advanced cleaning of nano-imprint lithography template in patterned media applications

Singh, Sherjang, Montgomery, M. Warren, Maurer, Wilhelm, Chen, Ssuwei, Dress, Peter, Kurataka, Nobuo, Gauzner, Gene, Dietze, Uwe

Year:

2010

Language:

english

File:

PDF, 12.37 MB

english, 2010

23

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Plasma monitoring of chrome dry etching for mask making

Kwon, Sung-Won, Montgomery, M. Warren, Maurer, Wilhelm, Kim, Dong-Chan, Nam, Dong-Seok, Woo, Sang-Gyun, Cho, Han-Ku

Year:

2010

Language:

english

File:

PDF, 596 KB

english, 2010

24

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Investigation of the influence of resist patterning on absorber LWR for 22-nm-node EUV lithography

Inazuki, Yuichi, Montgomery, M. Warren, Maurer, Wilhelm, Shimomura, Takeya, Abe, Tsukasa, Ogase, Taichi, Kawashima, Satoshi, Takigawa, Tadahiko, Mohri, Hiroshi, Hayashi, Naoya

Year:

2010

Language:

english

File:

PDF, 927 KB

english, 2010

25

Measurements of sharing in Multics

Montgomery, Warren A.

Journal:

ACM SIGOPS Operating Systems Review

Year:

1977

Language:

english

File:

PDF, 496 KB

english, 1977

26

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Advanced binary film for 193nm lithography extension to sub-32-nm node

Nozawa, Osamu, Montgomery, M. Warren, Maurer, Wilhelm, Shishido, Hiroaki, Hashimoto, Masahiro, Ohkubo, Yasushi, Mitsui, Hideaki

Year:

2010

Language:

english

File:

PDF, 1.02 MB

english, 2010

27

Market Driven Manufacturing

Warren H. Hausman, David B. Montgomery

Journal:

Journal of Market-Focused Management

Year:

1997

Language:

english

File:

PDF, 142 KB

english, 1997

28

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Challenges and promises in the fabrication of bit patterned media

Moneck, Matthew T., Montgomery, M. Warren, Maurer, Wilhelm, Zhu, Jian-Gang

Year:

2010

Language:

english

File:

PDF, 1.54 MB

english, 2010

29

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - An analysis of correlation between scanning direction and defect detection at ultra high resolution

Lim, Kwon, Montgomery, M. Warren, Maurer, Wilhelm, Choi, SungPil, Cho, Wonil, Chung, Dong Hoon, Jeon, Chan-Uk, Cho, HanKu

Year:

2010

Language:

english

File:

PDF, 750 KB

english, 2010

30

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - Investigation of buried EUV mask defect printability using actinic inspection and fast simulation

Clifford, Chris H., Zurbrick, Larry S., Montgomery, M. Warren, Chan, Tina T., Neureuther, Andrew R., Goldberg, Kenneth A., Mochi, Iacopo, Liang, Ted

Year:

2009

Language:

english

File:

PDF, 729 KB

english, 2009

31

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Two complementary methods to characterize long range proximity effects due to develop loading

Sundberg, Linda K., Wallraff, Greg M., Friz, Alexander M., Davis, Blake, Zweber, Amy E., Lovchik, Robert, Delamarche, Emmanuel, Senna, Tasuku, Komizo, Toru, Hinsberg, William D., Montgomery, M. Warren

Year:

2010

Language:

english

File:

PDF, 2.96 MB

english, 2010

32

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - Aerial plane inspection for advanced photomask defect detection

Kim, Won Sun, Zurbrick, Larry S., Montgomery, M. Warren, Park, Jin Hyung, Chung, Dong Hoon, Jeon, Chan Uk, Cho, Han Ku, Hutchinson, Trent, Lee, Oscar, Huang, William, Dayal, Aditya

Year:

2009

Language:

english

File:

PDF, 1.25 MB

english, 2009

33

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Metrology, Inspection, and Process Control for Microlithography XXV - Scatterometry for EUV lithography at the 22-nm node

Raymond, Christopher J., Bunday, Benjamin, Vartanian, Victor, Ren, Liping, Huang, George, Montgomery, Cecilia, Montgomery, Warren, Elia, Alex, Liu, Xiaoping

Year:

2011

Language:

english

File:

PDF, 4.27 MB

english, 2011

34

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Extreme Ultraviolet (EUV) Lithography VIII - Irresistible Materials multi-trigger resist: the journey towards high volume manufacturing readiness

Panning, Eric M., Goldberg, Kenneth A., Montgomery, Warren, McClelland, Alexandra L., Ure, David, Roth, John, Robinson, Alex P. G.

Year:

2017

Language:

english

File:

PDF, 961 KB

english, 2017

35

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advances in Patterning Materials and Processes XXXII - Evaluation of novel processing approaches to improve extreme ultraviolet (EUV) photoresist pattern quality

Wallow, Thomas I., Hohle, Christoph K., Montgomery, Cecilia, Chun, Jun Sung, Fan, Yu-Jen, Jen, Shih-Hui, Neisser, Mark, Cummings, Kevin D., Montgomery, Warren, Saito, Takashi, Huli, Lior, Hetzer, Davi

Year:

2015

Language:

english

File:

PDF, 1006 KB

english, 2015

36

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - Effect of SRAF placement on process window for technology nodes that uses variable etch bias

Seoud, Ahmed M., Zurbrick, Larry S., Montgomery, M. Warren, Tawfik, Tamer M.

Year:

2009

Language:

english

File:

PDF, 347 KB

english, 2009

37

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Optimize the OPC control recipe with cost function

Liu, Qingwei, Montgomery, M. Warren, Maurer, Wilhelm, Zhang, Liguo

Year:

2010

Language:

english

File:

PDF, 385 KB

english, 2010

38

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - Mask inspection placement maps for improving overlay

Parizat, Ziv, Zurbrick, Larry S., Montgomery, M. Warren, de Kruif, Robert, Finders, Jo, Minnaert-Janssen, Ingrid, Duray, Frank, Ben Yishai, Michael, Mangan, Shmoolik, Cohen, Yaron, Englard, Ilan

Year:

2009

Language:

english

File:

PDF, 1.26 MB

english, 2009

39

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Line width roughness control and pattern collapse solutions for EUV patterning

Petrillo, Karen, La Fontaine, Bruno M., Naulleau, Patrick P., Huang, George, Ashworth, Dominic, Georger, Jacque, Ren, Liping, Cho, K. Y., Montgomery, Warren, Wurm, Stefan, Kawakami, Shinichiro, Dunn,

Year:

2011

Language:

english

File:

PDF, 2.90 MB

english, 2011

40

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - Plasma characterization of Tetra III chrome etch system

Grimbergen, Michael, Zurbrick, Larry S., Montgomery, M. Warren, Nest, D. G., Yu, Keven, Leung, T. Y. B., Chandrachood, Madhavi, Ouye, Alan, Singh, Saravjeet, Ibrahim, Ibrahim, Kumar, Ajay, Graves, Dav

Year:

2009

Language:

english

File:

PDF, 189 KB

english, 2009

41

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Multi-layer model vs. single-layer model for N and P doped poly layers in etch bias modeling

Li, Jianliang, Montgomery, M. Warren, Maurer, Wilhelm, Vidal-Russell, Ezequiel, Beale, Daniel, Wang, Chunqing, Melvin III, Lawrence S.

Year:

2010

Language:

english

File:

PDF, 21.77 MB

english, 2010

42

[ACM Press the sixth symposium - West Lafayette, Indiana, United States (1977.11.16-1977.11.18)] Proceedings of the sixth symposium on Operating systems principles - SOSP '77 - Measurements of sharing in Multics

Montgomery, Warren A.

Year:

1977

Language:

english

File:

PDF, 496 KB

english, 1977

43

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - Expanding the lithography process window (PW) with CDC technology

Wang, Sz-Huei, Zurbrick, Larry S., Montgomery, M. Warren, Chen, Yu-Wan, Kuo, Chung Ming, Graitzer, Erez, Ben-Zvi, Guy, Cohen, Avi

Year:

2009

Language:

english

File:

PDF, 767 KB

english, 2009

44

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Study of EUV mask inspection technique using DUV light source for hp22nm and beyond

Hirano, Ryoichi, Kikuiri, Nobutaka, Hashimoto, Hideaki, Takahara, Kenichi, Hirono, Masatoshi, Shigemura, Hiroyuki, Montgomery, M. Warren, Maurer, Wilhelm

Year:

2010

Language:

english

File:

PDF, 1.08 MB

english, 2010

45

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Resist process windows in electron-beam lithography

Jamieson, Andrew T., Montgomery, M. Warren, Maurer, Wilhelm, Wilcox, Nathan, Kwok, Wai Y., Kim, Yong Kwan

Year:

2010

Language:

english

File:

PDF, 1.10 MB

english, 2010

46

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Mask shop automation: station controllers for photomask manufacturing

Lager, Derek, Montgomery, M. Warren, Maurer, Wilhelm, Nadamuni, Venkatesh

Year:

2010

Language:

english

File:

PDF, 881 KB

english, 2010

47

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - An advanced modeling approach for mask and wafer process simulation

Karakas, Ahmet, Montgomery, M. Warren, Maurer, Wilhelm, Elsen, Erich, Torunoglu, Ilhami, Andrus, Curtis

Year:

2010

Language:

english

File:

PDF, 600 KB

english, 2010

48

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Model-based double dipole lithography for sub-30nm node device

Je, A-Young, Montgomery, M. Warren, Maurer, Wilhelm, Choi, Soo-Han, Lee, Jeong-Hoon, Lee, Ji-Young, Word, James, Park, Chul-Hong, Lee, Sang-Hoon, Yoo, Moon-Hyun, Kim, Gyu-Tae

Year:

2010

Language:

english

File:

PDF, 3.02 MB

english, 2010

49

Mapping the Early Language Environment Using All-Day Recordings and Automated Analysis

Gilkerson, Jill, Richards, Jeffrey A., Warren, Steven F., Montgomery, Judith K., Greenwood, Charles R., Kimbrough Oller, D., Hansen, John H. L., Paul, Terrance D.

Journal:

American Journal of Speech-Language Pathology

Year:

2017

Language:

english

File:

PDF, 609 KB

english, 2017

50

Clinical response to varying the stimulus parameters in deep brain stimulation for essential tremor

Alexis M. Kuncel, Scott E. Cooper, Barbara R. Wolgamuth, Merlise A. Clyde, Scott A. Snyder, Erwin B. Montgomery Jr., Ali R. Rezai, Warren M. Grill

Journal:

Movement Disorders

Year:

2006

Language:

english

File:

PDF, 199 KB

english, 2006

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